Xenon monochloride (XeCl) is an active gas mixture that produces light at a wavelength of 308nm and is commonly used in crystallization processes in flat panel display panel (FPD) applications.

Neon is typically used as a buffer gas for excimer lasers used in LTPS crystallization.

The volume proportion of active gases in the mixture is very small, the halogen gas in the mixture is far less than 1%, the proportion of noble gases is between 1-10%, buffer gas is occupied by the remaining 90 to 99% of the mixture.

The gas mixture is a consumable used to generate tens of millions of laser pulses. FPD manufacturers may replace the gas mix in their ELA systems every few days to maintain optimal performance. They can also use the gas in the system for up to a week without replacing it.

How much gas to use and how often to replace it depends on the design of the laser, the utilization of the tools, the performance level to be achieved, and some other equipment parameters and process parameters.